On the approach to the analysis of the growth of epitaxial layers by pulsed laser deposition
Evgeny L. Pankratov1, 2
1Nizhny Novgorod State University, 23 Gagarin Avenue, Nizhny Novgorod, 603950, Russia.
2Nizhny Novgorod State Technical University, 24 Minin Street, Nizhny Novgorod, 603950, Russia.
DOI:
https://doi.org/10.7494/cmms.2021.4.0768
Abstract:
This paper considers an analytical approach for the prognosis of mass and heat transport during the growth of epitaxial layers by means of pulsed laser deposition. The approach provides the opportunity to make a prognosis which takes into account the spatial and temporal variations of their parameters and, at the same time, the nonlinearity of these processes. Based on this approach, the influence of the variation of several parameters on the growth process is investigated.
Cite as:
Pankratov, E.L. (2021). On the approach to the analysis of the growth of epitaxial layers by pulsed laser deposition. Computer Methods in Materials Science, 21(4), 203–208. https://doi.org/10.7494/cmms.2021.4.0768
Article (PDF):
Keywords:
Pulsed laser deposition, Mass and heat transport, Analytical modelling
References:
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